Principles, Characteristics, and Nanotechnology Applications
Hardback
Publication Date: 28/06/2013
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
- ISBN:
- 9781118062777
- 9781118062777
- Category:
- Semi-conductors & super-conductors
- Format:
- Hardback
- Publication Date:
- 28-06-2013
- Language:
- English
- Publisher:
- John Wiley & Sons Inc
- Country of origin:
- United States
- Edition:
- 2nd Edition
- Pages:
- 272
- Dimensions (mm):
- 241x161x21mm
- Weight:
- 0.57kg
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