This book provides a comprehensive review of the primary industrial review of the primary industrial hygiene topics relevant to semiconductor processing: chemical and physical agents, and ventilation systems. The book also has excellent chapters on newer industrial hygiene concerns that are not specific to the semiconductor industry: ergonomics, indoor air quality, personal protective equipment, plan review and records retention. While much of the information in these chapters can be applied to all industries, the focus and orientation is specific to issues in the semiconductor industry. Additional detail is provided on semiconductor processing technology through silicon and III-V process descriptions. A bibliography on processing technology for semiconductors is included. Michael Williams and David Baldwin are two of the premier industrial hygienists in the semiconductor industry. Paul Manz provided information on continuous gas monitoring. Contents Include: Introduction: Foreword Overview of Book Background. IH Monitoring: Overview of IH Monitoring Assessment Tools Bio-monitoring-Urinary Arsenic Testing Chemical Agents.
IH Monitoring-Physical Agents: Noise Non-ionizing Radiation Ionizing Radiation. Ventilation: Types Monitoring Guidelines and Standards. Personal Protective Equipment (PPE) Chemical Protective gloves Respiratory Protection. Indoor Air Quality (AQ): Recognition of IAQ Problems Odor Identification Causative Agents Evaluation of IAQ Problems Generally Recognized Acceptable Levels Industrial Hygiene IQA Monitoring Equipment Prevention of IAQ Problems Records. Ergonomics: Identification and Evaluation of Physical Stessors Stressful Postures Associated with CTD'S Semiconductor Ergonomic/Material Handling Exposures Ergonomic Design and Layout Principles Semiconductor Equipment. IH Record-Keeping: General Continuous Monitoring Records Ventilation Records Employee Communication Personnel Records Plan Review Appendix A-Silicon Ingot and Wafer Manufacturing Appendix B-III-V Ingot and Wafer-Light-Emitting Diode (LED) Appendix C-III-V Microwave IC Appendix D-Safety Consideration During Maintenance Following Arsenic and Phosphorus Operations.