Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Epub (Kobo), Epub (Adobe)
Publication Date: 22/04/2016
- ISBN:
- 9781118747384
- 9781118747384
- Category:
- Mechanical engineering & materials
- Format:
- Epub (Kobo), Epub (Adobe)
- Publication Date:
- 22-04-2016
- Language:
- English
- Publisher:
- Wiley
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