The two dozen papers generally discuss either processing or characterizing, but more specifically the surface and interface investigation of ion-beam-deposited silicon oxide thin film, charging damage during plasma-enhanced dielectric deposition, compound formation and the segregation of impurities during the low-energy ion irradiation of silicon, silicon oxynitride as a versatile material for integrated optics applications, and other topics. Annotation c. Book News, Inc., Portland, OR (booknews.com)