6 1/2 X 9 7/16 in Introduction (C. Claeys, E. Simoen).
Chapter 1. Germa nium Materials (B. Depuyt et al.).
Chapter 2. Grown-in Defects in Ge (J. Vanhellemont et al.).
Chapter 3. Diffusion and Solubility of Dopants in Germanium (E. S imoen, C. Claeys).
Chapter 4. Oxygen in Germanium (P. Clauws).
Chapter 5. Metals in Germanium (E. Simoen, C. Claeys).
Chapter 6. Ab-initio Modelling of D efects in Germanium (R. Jones, J. Coutinho).
Chapter 7. Radiation Performance of Ge Technologies (V. Markevich et al. ).
Chapter 8. Electrical Performance of Devices (M. Houssa et al.).
Chapter 9. Device Modeling (D. Esseni < EM>et al.).
Chapter 10. Nanoscale Germanium MOS Dielec trics and Junctions (C. On Chui, K.C. Saraswat).
Chapter 11 . Advanced Germanium MOS Devices (C. On Chui, K.C. Saraswat).
Chapter 12. Alternative Ge Applications.
Chapter 13. Tre nds and Outlook (E. Simoen, C. Claeys).
Chapter 1. Germa nium Materials (B. Depuyt et al.).
Chapter 2. Grown-in Defects in Ge (J. Vanhellemont et al.).
Chapter 3. Diffusion and Solubility of Dopants in Germanium (E. S imoen, C. Claeys).
Chapter 4. Oxygen in Germanium (P. Clauws).
Chapter 5. Metals in Germanium (E. Simoen, C. Claeys).
Chapter 6. Ab-initio Modelling of D efects in Germanium (R. Jones, J. Coutinho).
Chapter 7. Radiation Performance of Ge Technologies (V. Markevich et al. ).
Chapter 8. Electrical Performance of Devices (M. Houssa et al.).
Chapter 9. Device Modeling (D. Esseni < EM>et al.).
Chapter 10. Nanoscale Germanium MOS Dielec trics and Junctions (C. On Chui, K.C. Saraswat).
Chapter 11 . Advanced Germanium MOS Devices (C. On Chui, K.C. Saraswat).
Chapter 12. Alternative Ge Applications.
Chapter 13. Tre nds and Outlook (E. Simoen, C. Claeys).
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